| 发明名称 |
SILICON BOAT AND METHOD FOR MANUFACTURING THE SAME |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a silicon boat and a method for manufacturing it to reduce particles created during thermal processing. SOLUTION: The method for manufacturing the silicon boat for supporting a semiconductor wafer W during thermal process comprises: a process of forming a silicon material into a boat by mechanical processing; and a process of removing or thinning a damaged layer D on the surface of the silicon material created by the mechanical processing.</p> |
| 申请公布号 |
JP2002076100(A) |
申请公布日期 |
2002.03.15 |
| 申请号 |
JP20000258151 |
申请日期 |
2000.08.28 |
| 申请人 |
MITSUBISHI MATERIALS SILICON CORP |
发明人 |
SHIOTA TAKAAKI;NONOGAKI YOSHIHISA;NAKADA YOSHINOBU |
| 分类号 |
H01L21/683;H01L21/22;H01L21/324;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/683 |
| 代理机构 |
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