发明名称 Method of producing spacer and method of manufacturing image forming apparatus
摘要 The present invention provides a method of producing a spacer provided between a first substrate and a second substrate on which an electron emitting device is arranged, the method including the step of forming a film on at least a portion of at least one surface of the spacer. The film forming step includes the step of preparing a bundle of a plurality of spacer base members, and the step of coating a film material on the bundle, and wherein the bundle on which the film material is coated has a mask layer for covering at least a film non-formation portion near the film formation portion of each of the plurality of spacer base members of the bundle.
申请公布号 US2002031974(A1) 申请公布日期 2002.03.14
申请号 US20010946534 申请日期 2001.09.06
申请人 ITO NOBUHIRO;FUSHIMI MASAHIRO 发明人 ITO NOBUHIRO;FUSHIMI MASAHIRO
分类号 H01J9/24;H01J9/18;H01J29/86;(IPC1-7):B05D1/32;H01J9/00 主分类号 H01J9/24
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