DETERMINATION OF CENTER OF FOCUS BY DIFFRACTION SIGNATURE ANALYSIS
摘要
The present invention provides methods for determination in lithographic wafer (10) by diffraction signature difference analysis utilizing a plurality of diffraction gratings (20).
申请公布号
WO0221075(A1)
申请公布日期
2002.03.14
申请号
WO2001US27657
申请日期
2001.09.05
申请人
ACCENT OPTICAL TECHNOLOGIES, INC.;LITTAU, MICHAEL, EUGENE;RAYMOND, CHRISTOPHER, J.
