DRY ETCHER

摘要

PURPOSE: A dry etcher is provided to easily form plenty of polymer, by mounting a carbon-containing carbon liner on the inner surface of an etch chamber so that reaction gas is reacted with carbon atoms generated from the carbon liner in an etch process. CONSTITUTION: Reaction gas for forming a pattern is induced into the etch chamber(20) where the etch process for forming the pattern is performed. A semiconductor wafer(24) having the pattern is placed on a chuck(22) installed in the etch chamber. The carbon-containing carbon liner(30) is formed on the inner surface of the etch chamber. The carbon liner of a cylindrical type is formed along the side of the inner surface of the etch chamber.