HALFTONE PHASE SHIFT PHOTOMASK AND BLANK FOR HALFTONE PHASE SHIFT PHOTOMASK

摘要

A blank for a halftone phase shift photomask formed of a multilayer film of at least two layers where a halftone phase shift layer on a transparent substrate includes at least a first layer principally containing molybdenum silicide and one or both of oxygen and nitrogen, characterized in that the multilayer film includes a second layer principally containing one of chromium and tantalum or a chromium-tantalum alloy, and the second layer is nearer to the transparent substrate than the first layer.