发明名称 |
Memory cell array having ferroelectric capacitors, method of fabricating the same, and ferroelectric memory device |
摘要 |
The present invention relates to: a memory cell array which is capable of decreasing the parasitic capacitance of signal electrodes and has ferroelectric layers making up ferroelectric capacitors and having a predetermined pattern; a method of fabricating the memory cell array, and a ferroelectric memory device. In the memory cell array, memory cells formed of ferroelectric capacitors are arranged in a matrix. The ferroelectric capacitors include first signal electrodes, second signal electrodes arranged in a direction intersecting the first signal electrodes, and ferroelectric layers disposed linearly along either the first signal electrodes or the second signal electrodes. Alternatively, the ferroelectric layers may be disposed only in intersection areas of the first and second signal electrodes.
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申请公布号 |
US2002031005(A1) |
申请公布日期 |
2002.03.14 |
申请号 |
US20010931915 |
申请日期 |
2001.08.20 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
NATORI EIJI;HASEGAWA KAZUMASA;OGUCHI KOICHI;NISHIKAWA TAKAO;SHIMODA TATSUYA |
分类号 |
H01L27/105;G11C11/22;H01L21/02;H01L21/8246;H01L27/10;(IPC1-7):G11C11/22 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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