PLASMA REACTOR COOLED CEILING WITH AN ARRAY OF THERMALLY ISOLATED PLASMA HEATED MINI-GAS DISTRIBUTION PLATES

摘要

A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate (220) for introducing a process gas into the reactor is supported on the chamber enclosure member (210) and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.