发明名称 PLASMA ENHANCED GAS REACTOR
摘要 <p>A reaction chamber (12, 49) is adapted to be coupled to a source of microwave radiation. A pair of opposed field enhancing electrodes (18, 21; 62, 63) concentrate microwave energy so as to form plasma in a localised region between the electrodes. Gas passages are arranged for passing a gaseous medium into and out of the chamber so that the gaseous medium passes through the said localised region of plasma. The electrodes comprise electrically conducting tubes (18, 21; 62, 63) held in electrode holders (17, 19; 53, 54) located in the chamber wall, the electrode tubes being removable and replaceable from outside of the apparatus.</p>
申请公布号 WO2002021567(A1) 申请公布日期 2002.03.14
申请号 GB2001003767 申请日期 2001.08.22
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