发明名称 THIN FILM SEMICONDUCTOR DEVICE HAVING A BUFFER LAYER
摘要 A thin film semiconductor device having improved operating characteristics and reliability of a thin film transistor formed on a glass substrate. The thin film semiconductor device has a thin film transistor 3 formed on a glass substrate 1 containing alkali metal. The surface of the glass substrate 1 is covered by a buffer layer 2. The thin film transistor 3 formed on this buffer layer 2 has a polycrystalline semiconductor thin film 4 as an active layer. The buffer layer 2 includes at least a silicon nitride film and protects the thin film transistor 3 from contamination by alkali metals such as Na and has a thickness such that it can shield the thin film transistor 3 from an electric field created by localized alkali metal ions (Na+).
申请公布号 US2002030188(A1) 申请公布日期 2002.03.14
申请号 US19960730015 申请日期 1996.10.11
申请人 HAYASHI HISAO;SHIMOGAICHI YASUSHI;KATO KEIJI 发明人 HAYASHI HISAO;SHIMOGAICHI YASUSHI;KATO KEIJI
分类号 H01L29/786;(IPC1-7):H01L31/20;H01L31/037;H01L31/036;H01L29/04 主分类号 H01L29/786
代理机构 代理人
主权项
地址