发明名称 Gasversorgung für Additive Lithographie
摘要 The invention relates to a device, to a set of tubes and to a method for carrying a gas or a liquid to a surface through a tube, especially in order to produce gas mixtures or to treat the surface using gas lithography. The tube or in the case of a set, each tube of the set has an inlet opening and an outlet opening. A shaft is allocated to each tube, this shaft being arranged in the axial direction of the tube and being displaceable in its longitudinal direction in relation to the tube, from a first position to a second position and vice versa. Each shaft bears a blocking body which blocks or unblocks the outlet when the shaft is in the first or second position. A gas reservoir and a supply line by which means the inside of the gas reservoir is connected to the inlet opening of each tube are also allocated to each tube, so that gas is able to flow from the inside of the gas reservoir into the tube.
申请公布号 DE10042098(A1) 申请公布日期 2002.03.14
申请号 DE20001042098 申请日期 2000.08.26
申请人 DEUTSCHE TELEKOM AG 发明人 KOOPS, HANS WILFRIED PETER;REINHARDT, ANDREAS
分类号 C23C16/455;C23F4/00;H01J37/305;H01J37/317;H01L21/027;H01L21/205;H05K3/08;(IPC1-7):G03F9/00;G03F7/20 主分类号 C23C16/455
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