MASK DESIGN AND METHOD FOR CONTROLLED PROFILE FABRICATION

摘要

A photolithography reticle (300) for use in conjunction with an exposure tool (330) to produce a tapered sidewall profile in photoresist (210) includes a solid portion (310) and multiple sub-resolution line portions (320). The solid portion has a width which is greater than a resolution of the exposure tool. The sub-resolution line portions have widths which are less than the resolution of the exposure tool. Each of the sub-resolution line portions (320) is spaced apart from the solid portion (310) and from the others of the plurality of sub-resolution line portions by less than the resolution of the exposure tool.