| 摘要 |
<p>A pattern of a transfer mask transferring a transfer pattern on a transferred substrate with an energy beam and having an opening pattern formed on a film part supported by a supporting frame part, wherein, when the transfer pattern is a shielded pattern having a peripheral part connected at at least one position, the portion of the shielded pattern where the ratio of the surface area of the pattern surface part on the transfer mask to the cross sectional area of the supported part is larger than 5000 is divided and expanded.</p> |
