发明名称 |
SHORT-CHANNEL SWITCHING ELEMENT AND ITS MANUFACTURING METHOD |
摘要 |
A short-channel switching element operating according to an operating principal not causing the short-channel effect. The short-channel switching element comprises an insulating layer (11), a source (13) formed on the insulating layer (11), a drain (14) formed on the insulating layer (11) opposed to the source (13) with a small spacing (12) having a length of 20nm, silicon quantum dots (15) deposited in the small spacing (12), having a grain size of below 10nm, and serving as a channel, a second insulating layer (16) formed over the source, drain, and small spacing (12), and a gate (17) formed on the second insulating layer in the region corresponding to the small spacing. A method for manufacturing such a short-channel switching element is also disclosed.
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申请公布号 |
WO0221600(A1) |
申请公布日期 |
2002.03.14 |
申请号 |
WO2001JP07088 |
申请日期 |
2001.08.17 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY CORPORATION;ODA, SHUNRI;NISHIGUCHI, KATSUHIKO |
发明人 |
ODA, SHUNRI;NISHIGUCHI, KATSUHIKO |
分类号 |
H01L29/06;H01L21/335;H01L21/336;H01L29/786;(IPC1-7):H01L29/786;H01L29/66 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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