发明名称 Trench mosfet with structure having low gate charge
摘要 A trench MOSFET includes a plurality of trench segments in an upper surface of an epitaxial layer, extending through a second conductivity type region into a first conductivity type epitaxial region, segment at least partially separated from an adjacent segment by a terminating region, and the trench segments defining a plurality of polygonal body regions within the second conductivity type. A first insulating layer at least partially lines each trench and a plurality of first conductive regions are provided within the trench segments adjacent to the first layer. Each of the conductive regions is connected to an adjacent first conductive region by a connecting conductive region, overlying the terminating region, that bridges at least one of the terminating regions and a plurality of first conductivity type source regions are within upper portions of the polygonal body regions and adjacent the trench segments, the source regions positioned outside the terminating regions.
申请公布号 AU8533501(A) 申请公布日期 2002.03.13
申请号 AU20010085335 申请日期 2001.08.29
申请人 GENERAL SEMICONDUCTOR, INC. 发明人 FWU-IUAN HSHIEH;KOON CHONG SO;YAN MAN TSUI
分类号 H01L21/336;H01L29/423;H01L29/78 主分类号 H01L21/336
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