| 摘要 |
PURPOSE: Provided is a resist developing apparatus equipped with a mesh-shaped nozzle, which can spray a developer on a photomask uniformly, therefore, can maintain line breadth uniformly. CONSTITUTION: The resist developing apparatus(200) contains a chuck(100) mounted rotatively and laying the photomask(110) thereon and the mesh-shaped nozzle(210), mounted over the chuck(100), for spraying the developer on the photomask(110), wherein the nozzle(210) has a plurality of spray holes having a width of 1-2mm and the space between the nozzle(210) and the photomask(110) is 5-10mm and the whole width of the nozzle(210) is larger than or the same as the photomask(110). |
