发明名称 Method and apparatus for focusing a laser
摘要 A method for focusing an ultrashort pulse laser relative to a workpiece using the position of a plasma formed by a laser. A laser beam is focused to a focal point. The high peak intensity of the ultrashort pulse laser ionizes air at the focal region to form a plasma. The intensity of the plasma varies as its position relative to the workpiece varies. The intensity of the plasma formed by the focused laser beam is detected. The position of the focal point relative to the workpiece is adjusted responsive to the detected intensity of the plasma.
申请公布号 US6355908(B1) 申请公布日期 2002.03.12
申请号 US19990282722 申请日期 1999.03.31
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TATAH ABDELKRIM;LIU XINBING
分类号 H05H1/00;B23K26/00;B23K26/04;B23K26/06;(IPC1-7):B23K26/00 主分类号 H05H1/00
代理机构 代理人
主权项
地址