POLYESTER FILM FOR PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a polyester film for a photoresist excellent in resolution in the photoresist while ensuring photosensitivity necessary for the photoresist, capable of preventing troubles such as cleavage and the falling of particles in the peeling of the substrate film and having good windability of the substrate film itself. SOLUTION: The polyester film comprises a laminated polyester obtained by disposing a polyester A layer having 0.03-3 μm thickness on at least one face of a polyester B layer, the content of inert particles having an average particle diameter 0.1-10 times the thickness of the polyester A layer in the polyester A layer is <0.5 wt.% and the content of inert particles having 0.05-2 μm average particle diameter in the polyester B layer is <0.5 wt.%. The haze of the laminated polyester film is <=5.0%.