| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of ensuring both a high film leaving property and high sensitivity in practical use independently of the amount of a quinonediazidodiazido-containing photosensitive agent used, excellent also in suitability to coating and uniformity in the line width of a resist pattern, having low process dependence and capable of forming a good pattern. SOLUTION: In the photosensitive resin composition containing an alkali- soluble resin and a quinonediazidodiazido-containing photosensitive agent, a mixture of a novolak resin having a weight average molecular weight (expressed in terms of polystyrene) of 3,000-15,000 and a styrene resin having a weight average molecular weight (expressed in terms of polystyrene) of 3,000-25,000 is used as the alkali-soluble resin. |
