PHOTOMASK WITH FILM SURFACE PROTECTING LAYER AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photomask with a film surface protecting layer for emulsion layer having high productivity, not lowering UV transmittance and excellent in scuffing and wear resistances and to provide a method for producing the photomask. SOLUTION: A transparent cured substance layer of an active energy beam curable composition having >=50% transmittance at 365 nm wavelength is formed as the film surface protecting layer for emulsion layer on the surface of an original plate of a photomask obtained by forming an emulsion layer on the surface of a substrate. The curable composition preferably contains 0.01-20 mass% photopolymerization initiator having <=100 (1/mol/cm) extinction coefficient (e) per mol at 365 nm wavelength.