| 摘要 |
PURPOSE: A substrate processing apparatus and a method for manufacturing a SEMICONDUCTOR device by using the substrate processing apparatus are provided to be capable of preventing or reducing generation of impurities and avoiding the tripping or the falling down of boats and preventing unprocessed boats from being affected by the heat generated from processed boats. CONSTITUTION: A substrate processing apparatus includes a process tube for processing a plurality of substrates, two boats(30,30A) for accommodating the substrates, two boat elevators(20,20A), a substrate transfer unit for loading and unloading the substrates into and from the boats(30,30A) when the boats(30,30A) are at the first position. In this apparatus, each boat elevator has one boat mounted thereon and each of the boat elevators carries a corresponding boat between a first position located below the process tube and two corresponding second positions. Each of the boat elevators performs loading and unloading the corresponding boat into and from the process tube at the first position. Further, in the apparatus, a center position of the process tube is disposed inside a triangle formed by connecting the substrate transfer unit and the two boat elevators(30,30A).
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