发明名称 METHOD OF REGENERATING COLOR FILTER SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of regenerating a color filter substrate enabling to reuse the substrate even when the color filter substrate turns into a defective product due to a defect or the like generated in a color filter layer by easily releasing the color filter layer in which a defect or the like is generated from the color filter substrate. SOLUTION: In forming the color filter layer 14 on an upper layer part of a semiconductor substrate 10 via an acrylic thermosetting resin layer 12, a defect 20 or the like is sometimes generated inside the color filter layer 14 and the color filter substrate 16 turns into the defective product. In this case the acrylic thermosetting resin layer 12 is decomposed by heat treatment at a temp. of 250-350 deg.C for 150-200 minutes, then is subsequently subjected to chemical treatment using a mixed liquid of hydrazine hydrate and ethylenediamine and is released from the semiconductor substrate 10. Thereby, the color filter layer 14 in which the defect 20 or the like is generated is easily released.</p>
申请公布号 JP2002071927(A) 申请公布日期 2002.03.12
申请号 JP20000259038 申请日期 2000.08.29
申请人 SONY CORP 发明人 SHIMIZU HIDEAKI
分类号 G02B5/20;(IPC1-7):G02B5/20 主分类号 G02B5/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利