| 摘要 |
PROBLEM TO BE SOLVED: To form a silica ceramic film, which can be easily calcined and contains no SiNH remaining in the ceramic film after calcination, which has low dielectric constant, superior in insulating property, heat resistance, wear resistance, corrosion resistance and transparency and useful as an interlayer insulating film, in the method of forming a silica ceramic film, by calcining a photosensitive polysilazane coating film which functions as a positive pattern, such as a photosensitive polysilazane composition, containing polysilazane and a photoacid generating agent. SOLUTION: The silica ceramic film is formed by applying a photosensitive polysilazane composition on a substrate, exposing the developing the forming coating film as required into a pattern, exposing the whole-surface coating film, humidifying to promote conversion of polysilazane into SiOH, and calcining. Conversion of polysilazane into SiOH is promoted, by using a gas with high humidity and heating the substrate in the humidifying process, which can decrease the humidifying time. |
