| 摘要 |
PROBLEM TO BE SOLVED: To provide a removing agent composition which can be handled easily, with which a resist can be removed, properly and which has superior anticorrosion effect for a Cu film. SOLUTION: The photoresist removing agent composition contains primary, secondary or tertiary alkylamines or primary, secondary or tertiary alkanolamines, water and 2-mercaptobenzimidazole as the main components, and as necessary, it may further contain a polar organic solvent. |
