| 摘要 |
The invention disclosed herein is related to a photoresist coating system that significantly prevents performance of the system being degraded by any bubble in, liquid photoresist. The proposed system comprises a pump, a series of pipelines, a reactor, a tank, a capacitor sensor, a photochopper sensor and a controller, where the capacitor sensor is coupled to the pipeline and the photochopper sensor is coupled to the pipeline. Thus, any bubble inside the pipeline is detected by the capacitor sensor or the photochopper sensor. In other words, any bubble in the photoresist is detected. The operation of the present photoresist coating system is terminated by the controller to protect any wafer inside the reactor, and a warning alarm is activated by the controller.
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