| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method which does not to give rise to the contamination, damage, etc., of raw glass without prolonging the exposure time even if a lot of patterns is formed by forming the shapes and positions of patterns with good accuracy in exposure when the fine patterns are formed on a cylinder surface by a photolithographic method. SOLUTION: The UV rays from a light source 11 of a long-sized shape are exposed to a photoresist film 31 disposed on the cylinder surface through a photomask 20 while the cylinder 30 surface and a photomask surface 21 are held in a proximity state.</p> |
