发明名称 |
Guard ring electrostatic chuck |
摘要 |
An electrostatic chuck is disclosed that is resistant to the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck. A guard ring surrounds the chuck and floats close to the self-bias potential induced by the plasma on the wafer. The voltage between the wafer and the closest electrode is thereby capacitively divided by the guard ring.
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申请公布号 |
USRE37580(E1) |
申请公布日期 |
2002.03.12 |
申请号 |
US19990272408 |
申请日期 |
1999.03.18 |
申请人 |
DORSEY GAGE CO., INC. |
发明人 |
BARNES MICHAEL SCOTT;KELLER JOHN HOWARD;LOGAN JOSEPH S.;TOMPKINS ROBERT E.;WESTERFIELD, JR. ROBERT PETER |
分类号 |
B23Q3/15;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H02N13/00 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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