SEMICONDUCTOR THIN FILM AND METHOD OF FABRICATING SEMICONDUCTOR THIN FILM, APPARATUS FOR FABRICATING SINGLE CRYSTAL SEMICONDUCTOR THIN FILM

摘要

PURPOSE: A semiconductor thin film is provided to have a performance very higher than that of a related art polycrystalline thin film and to be suitable for fabricating a device having stable characteristics and to be fabricated for a sufficiently short time. CONSTITUTION: A method of fabricating a single crystal thin film includes the steps of: forming a non-single crystal thin film on an insulating base; subjecting the non-single crystal thin film to a first heat-treatment, thereby forming a polycrystalline thin film in which polycrystalline grains are aligned in an approximately regular pattern; and subjecting the polycrystalline thin film to a second heat-treatment, thereby forming a single crystal thin film in which the polycrystalline grains are bonded to each other.