| 摘要 |
<p>PURPOSE:To provide the halftone system phase shift mask with which a defec tive region is selectively and surely coated with a light shielding body, the difference of the transfer pattern shape after mask correction from a desired shape is practicably negligible and the defective region is corrected. CONSTITUTION:The halftone system phase shift mask 1B which has half light shielding regions 12 and light transmission regions 10 and varies in the phase of the light past the half light shielding regions and the phase of the light past the light transparent regions includes the defective regions 14 which varies in phase, amplitude transmittance or both thereof from prescribed values and exists in the half light shielding region 12 adjacent or proximate to the light transmission region 10. In addition, the correction region 16 within the defective region larger than the defective region and a part 10A of the light transmission region adjacent or proximity to the correction region 16 is coated with the light shielding body 30 having the amplitude transmittance at which a resist material is not sensitized.</p> |
