发明名称 PLASMA RESISTANT QUARTS GLASS-MADE FIXTURE
摘要 PROBLEM TO BE SOLVED: To provide a fixture free from abnormal etching or generation of particles even when used in an apparatus of generating a plasma, and excellent in plasma etching characteristic. SOLUTION: This plasma resistant quarts glass-made fixture used in the apparatus of generating the plasma has a surface roughness Ra of 5-0.05μm of the quarts glass surface and 0 or 1 of the content of bubbles in the glass in terms of foam grade by DIN, and has no micro cracking layer on the surface.
申请公布号 JP2002068767(A) 申请公布日期 2002.03.08
申请号 JP20000259641 申请日期 2000.08.29
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 INAGI KYOICHI;HAYASHI NAOKI;SEGAWA TORU
分类号 C03B20/00;C03C15/00;H01L21/302;H01L21/3065;(IPC1-7):C03B20/00;H01L21/306 主分类号 C03B20/00
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