发明名称 |
PLASMA RESISTANT QUARTS GLASS-MADE FIXTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a fixture free from abnormal etching or generation of particles even when used in an apparatus of generating a plasma, and excellent in plasma etching characteristic. SOLUTION: This plasma resistant quarts glass-made fixture used in the apparatus of generating the plasma has a surface roughness Ra of 5-0.05μm of the quarts glass surface and 0 or 1 of the content of bubbles in the glass in terms of foam grade by DIN, and has no micro cracking layer on the surface.
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申请公布号 |
JP2002068767(A) |
申请公布日期 |
2002.03.08 |
申请号 |
JP20000259641 |
申请日期 |
2000.08.29 |
申请人 |
SHINETSU QUARTZ PROD CO LTD |
发明人 |
INAGI KYOICHI;HAYASHI NAOKI;SEGAWA TORU |
分类号 |
C03B20/00;C03C15/00;H01L21/302;H01L21/3065;(IPC1-7):C03B20/00;H01L21/306 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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