PRODUCTION METHOD FOR SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide an effective production method for a sputtering target large in scale and also having a fully homogenous fine structure, without a conventional process requiring long term and high-load energy. SOLUTION: This production method for the sputtering target is characterized in that a raw material of the sputtering target is melted and cast to form a cast ingot, the hot-top part of this ingot is removed, and thereafter, the cast ingot thus obtained is subjected to hot press to be compress-worked to a required shape.