CHEMICAL VAPOR DEPOSITION EQUIPMENT

摘要

PURPOSE: Chemical vapor deposition equipment is provided to reduce the possibility that a wafer is contaminated by particles according to the movement of the wafer, by transferring a quartz tube toward the wafer while not transferring a wafer boat where the wafer is loaded. CONSTITUTION: A reactor furnace(200) of which one side is open includes the quartz tube(210). A fixed wafer boat settling plate(300) closes the inside of the quartz tube while the wafer boat(10) is settled in the quartz tube. A reactor furnace transfer unit(400) makes the reactor furnace separated from the wafer boat settling plate by a predetermined interval. A reaction gas supply unit(500) is installed in the wafer boat settling plate to supply reaction gas to the inside of the quartz tube. An exhaust unit(600) is installed in the wafer boat settling plate to exhaust the gas inside the quartz tube.