| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron microscope in which an operator can easily and appropriately set the visual field to a defective part to be observed. SOLUTION: This electron microscope, which is used for observing defects/ foreign matters on the surface of or in a mask used for exposing a wafer for semiconductor or a semiconductor to a pattern, has a function of fetching the measurement data of the coordinate positions or sizes of the defects/foreign matters observed by means of another wafer/mask inspection device, moving the observational visual field section of the microscope to the portions where the defects/foreign matters exist, and graphically showing the coordinates of the defects/foreign matters obtained by the wafer/mask inspection device, the observational visual field section of the microscope, and its peripheral area. In addition, the switch of a pointing device had a function of moving the observational visual field section of the microscope to the position designated by a pointer on the shown sketch, and another function of changing the sketch as the visual field section moves.</p> |
