| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method for a titanium nitride film, capable of forming the titanium nitride film good in quality and having functions such as a reflection property suitable for a surface-treatment film of, for example a cathode-ray tube, a photoabsorption property for contact improvement, the prevention of leak of electromagnetic field, and the like. SOLUTION: The titanium nitride film can be formed by keeping a partial pressure of residual water in atmosphere for film-forming at 0.3% or below to a total pressure, when this titanium film is formed by a reactive sputtering method. |
