发明名称 ALKALI DEVELOPABLE PHOTOSETTING AND THERMOSETTING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide an alkali developable photosetting and thermosetting composition with high heat resistance and high resolution properties which is easy to handle due to the liquid and which uses a calixarene derivative excellent in the heat resistance together with the photosetting and the alkaline solubility. SOLUTION: The composition contains (A) the calixarene derivative having a polymerizable unsaturated group represented by formula (1) [wherein 0.1<=m<1.0; n is an integer of 3-10; R is a 1-12C alkyl group; X is any one or two sorts or more of combination of formulas (2) and vinylbenzyl group; Y is formulas (3); R1 is a hydrogen atom, hydroxy group or methyl group; R2 is a hydrogen atom or a methyl group; Z is a hydrogen atom and/or W wherein W is an acid anhydride residue and/or -CH2COOH: the rate of part (a) and part (b) represented by formula (4) which contains them is (a):(b)=0-100:100-0], a phenolic hydroxyl group and/or a carboxyl group, (B) a photopolymerizable initiator, (C) a reactive dilution, (D) an organic solvent, (E) a thermosetting compound having at least two oxirane or oxetanyl groups in a molecule and (F) a curing accelerating agent.
申请公布号 JP2002069140(A) 申请公布日期 2002.03.08
申请号 JP20000262959 申请日期 2000.08.31
申请人 TAIYO INK MFG LTD;UNIV KANAGAWA 发明人 NISHIKUBO TATATOMI;KAMEYAMA ATSUSHI;MIYABE HIDEKAZU;SASAKI MASAKI;NICHIMA YUKITOMO
分类号 G03F7/004;C08F290/06;C08G59/42;C08G59/62;G03F7/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址