MASKING MECHANISM FOR SUBSTRATE AND COMBINATORIAL FILM- FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a masking mechanism for a substrate capable of separately forming plural films on a simple substrate, and to provide a combinatorial film-forming apparatus capable of effectively forming films. SOLUTION: The masking mechanism 10 for the substrate lays out a mask 12 at a position closed to a substrate 1, and sets a film-forming area through a hole 13 of the mask 12. This mask 12 is equipped with a contacting part 14 having a contacting face adhering to the substrate 1, and a shield part 15 which shields a substrate face 1a around the contacting part 14 when the contacting part 14 contacts the substrate face 1a. The shield part 15 contacts the substrate face in its peripheral part.