DEVICE FOR DEPOSITING ESPECIALLY, CRYSTALLINE LAYERS ON ONE OR MORE SUBSTRATES, ESPECIALLY SUBSTRATES WHICH ARE ALSO CRYSTALLINE

摘要

The invention relates to a device for depositing especially, crystalline layers onto one or more substrates, especially substrates which are also crystalline, in a process chamber (1), using reaction gases which are guided into said process chamber (1), where they undergo pyrolytic reaction. The device comprises a reverse-heatable support plate (3) which forms a wall of the process chamber and which can especially be heated with a high frequency, consisting of especially inertly coated graphite; a gas inlet mechanism (6) which is located in the centre of the process chamber (1), said process chamber having a circular cross-section, and which is allocated to a cover plate (4) that is situated at a distance from the support plate (3); and a gas outlet ring (5) which forms the outer limit of the process chamber (1) and which has a plurality of radial gas outlets (25). According to the invention, the gas outlet ring (5) consists of solid graphite in order to keep the isothermal profile inside the process chamber as flat as possible.