| 摘要 |
PURPOSE: Provided is a purifying column which facilitate the purification of harmful gases containing powdered material discharged from e.g. a semiconductor manufacturing process without causing any sharp rise in pressure loss, while the purifying operation and maintenance of facilities are easy. CONSTITUTION: The column of has a gas inlet(1) of the harmful gas, a bed of a purifying agent(2) and a gas outlet(3) for letting out purified gases. A horizontal plate(4) is fitted at a position above the bed of a purifying agent(2) and below the gas inlet(1) in the column so as to allow an outer edge of the horizontal plate(4) to make intimate contact with the inner wall surface(5) of the column, and upstanding pipe(6) for guiding gases from the gas inlet(1) to below the horizontal plate(4) is fitted passing through the horizontal plate(4). A collector 7 for powdered material is formed with an inner wall surface(5) of the column, an upper surface of the horizontal plate(4) and an outer wall surface of the pipe(6). The column of has usually cylindrical form and the horizontal plate(4) is usually a circular disk.
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