发明名称 Alignment marks and method of forming the same
摘要 Alignment marks and a method of forming the alignment marks are provided. The method includes the steps of forming a first alignment mark in an alignment mark forming area on the substrate, forming an opaque layer that is opaque to the alignment light above the alignment mark forming area where the first alignment mark is formed, substantially flattening a surface of the opaque layer, and forming a second alignment mark on a side where the alignment light is incident with respect to the flattened opaque layer.
申请公布号 US2002028528(A1) 申请公布日期 2002.03.07
申请号 US20010769448 申请日期 2001.01.26
申请人 OHTAKA SHIRO 发明人 OHTAKA SHIRO
分类号 G03F9/00;H01L21/027;H01L23/544;(IPC1-7):H01L21/00 主分类号 G03F9/00
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