PURPOSE: A bath of cleaning a wafer is provided to control the possibility of a wafer trouble caused by contaminated water, by minimizing contamination of deionized water caused by outer circumstances of the bath when the wafer is cleaned by deionized water. CONSTITUTION: A bath's upper cover unit(13) prevents air in a contaminated cleaner room from being melted and diffused to the wafer cleaning bath. A bath's side exhaust apparatus prevents the air of the cleaner room from being induced through an exhaust hole when cleaning water used in an exhaust apparatus is exhausted. A bath's lower drain unit prevents the air of the cleaner room from being induced through the exhaust hole when the deionized water inside the bath is drained. A nitrogen supply unit is installed in the lower portion of the bath to prevent leakage of nitrogen gas inside the bath. The wafer cleaning bath intercepts cleaning surroundings inside the bath from outer surroundings.
