PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF

摘要

A positive photosensitive polysilazane composition which comprises: a modified polysilsesquiazane having basic structural units represented by the general formula -[SiR<6>(NR<7>)1.5]-, containing other structural units represented by the general formula -[SiR<6>2NR<7>]- and/or [SiR<6>3(NR<7>)0.5]- in an amount of 0.1 to 100 mol% based on the basic structural units, and having a number-average molecular weight of 100 to 100,000 (in the formulae, R<6> and R<7> each independently represents hydrogen, C1-3 alkyl, or (un)substituted phenyl); and a photo-acid generator. It preferably contains a water-soluble compound as a shape stabilizer. The composition is applied to a substrate and pattern-wise exposed to light. The coating film exposed is moistened and then developed with an aqueous alkali solution. The resultant pattern is wholly exposed to light, subsequently moistened again, and then burned. Thus, a fine silica-based ceramic film which has satisfactory properties and is suitable as an interlayer dielectric is formed in a short time.