| 摘要 |
<p>A system for plasma processing using electron-free ion-ion plasmas, wherein the substrate (14) bias waveform is synched to a pulsed RF drive. A delay (22) is included between the end of an RF drive pulse and the start of a bias pulse, to allow the electron population (29) to drop to approximately zero. By using a source gas mixture which has highly electronegative components, substrate bombardment with negative ions can be achieved.</p> |
