发明名称 Entwicklungsflüssigkeitsversorgungsvorrichtung
摘要 <p>Disclosed herein is a device for supplying a liquid to a plurality of apparatuses which apply the liquid to substrates to process the substrates. The device comprises a tank (170) containing the liquid, a supply passage (162) for supplying the liquid from the tank to the apparatuses, branch passages (158, 172) connected to the supply passage, for supplying the liquid to liquid-applying members provided in the apparatuses, and valves (160, 174) provided on the branch passages, respectively. The valves are controlled each other, for opening and closing the branch passages such that the liquid-applying member of one apparatus applies the liquid to a substrate while the liquid-applying member of any other apparatus remains to apply the liquid to a substrate. <IMAGE></p>
申请公布号 DE69707097(T2) 申请公布日期 2002.03.07
申请号 DE1997607097T 申请日期 1997.12.18
申请人 TOKYO ELECTRON LTD., TOKIO/TOKYO 发明人 KIMURA, YOSHIO;MORITA, SATOSHI;MATSUYAMA, YUJI;SEMBA, NORIO
分类号 G03F7/30;(IPC1-7):G03F7/16 主分类号 G03F7/30
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