发明名称 SHADOW MASK FOR COLOR CRT
摘要 PURPOSE: A shadow mask for a color CRT is provided to enhance a color purity by preventing a mislanding of the electron beam as a doming is lowered by reducing a thermal deformation of the shadow mask. CONSTITUTION: An electron reflection film is formed at not only the surface of the shadow mask(7) but also the inner surface of the hole. The electron reflection film is printed by using a paste composed of powder of tungsten oxides(WO3), bismuth oxides(BiO3), and lead oxides(PbO) with 50-70 wt %, frit glass with 15-20 wt %, and solvent with 10-30 wt %. Therefore, a doming phenomenon is lowered by reducing a thermal deformation of the shadow mask through properly adjusting material having a high heat emit rate and a reflection efficiency of the electron beams.
申请公布号 KR20020017234(A) 申请公布日期 2002.03.07
申请号 KR20000050435 申请日期 2000.08.29
申请人 LG ELECTRONICS INC. 发明人 CHO, YUN RAE;KIM, SANG MUN;KIM, YEONG GU
分类号 H01J29/76;(IPC1-7):H01J29/76 主分类号 H01J29/76
代理机构 代理人
主权项
地址