发明名称 GAS PURIFICATION SYSTEM AND METHOD FOR REMOVING IMPURITIES FROM GAS
摘要 PURPOSE: A gas purification system is provided to increase a residence time of a gas in the system for maximization of a purification efficiency, reduce an amount of energy used in processing, and improve the gas by thermal management used in the gas purification processing. CONSTITUTION: The gas purification system(12) comprises a gas inlet(14) for impure gas; a purifier which is connected to the gas inlet and comprises a purifier inlet(24) for heated impure gas, a first section connected to the purifier inlet(24), a second section connected to the first section, a gas absorbing material inside the first and second sections producing a gas purified by removing impurities from the impure gas and a purifier outlet(32) for purified gas connected to the second section; a Joule-Thompson cooler(26) which is connected to the purifier and cools the purified gas to a temperature of about 100 to 200 deg.C so that the first and second sections are divided; and a gas outlet(38) for the purified gas. The method for removing impurities from a gas comprises the steps of heating an impure gas; producing a purified gas having an extremely small amount of residual hydrogen by contacting the heated impure gas with an impurity absorbing material in a vessel; cooling the purified gas to a temperature of 100 to 200 deg.C by a Joule-Thompson cooler connected to the vessel; and removing at least partial amount of the residual hydrogen by contacting the purified gas with the hydrogen absorbing material.
申请公布号 KR20020018140(A) 申请公布日期 2002.03.07
申请号 KR20010052811 申请日期 2001.08.30
申请人 C&M, INC. 发明人 LIM, GYE JIN;SA, GONG GWON;WEBER DAN
分类号 B01D53/74;B01D53/04;(IPC1-7):B01D53/74 主分类号 B01D53/74
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