SUBSTRATE SUPPORT FOR PLASMA PROCESSING,申请号EP20000942700-传众专利搜索

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发明名称	SUBSTRATE SUPPORT FOR PLASMA PROCESSING
摘要
申请公布号	EP1183716(A1)	申请公布日期	2002.03.06
申请号	EP20000942700	申请日期	2000.06.07
申请人	APPLIED MATERIALS, INC.	发明人	SHAMOUILIAN, SHAMOUIL;KUMAR, ANANDA, H.;SALIMIAN, SIAMAK;DAHIMENE, MAHMOUD;CHAFIN, MICHAEL, G.;GRIMARD, DENNIS, S.
分类号	C23C16/458;H01J37/32;H01L21/00;H01L21/02;H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):H01L21/00;H01L21/68	主分类号	C23C16/458
代理机构		代理人
主权项
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