发明名称 LATERAL DMOS IMPROVED BREAKDOWN STRUCTURE AND METHOD
摘要 In a lateral DMOS device 10 breakdown voltage is controlled by a voltage divider 50 coupled at opposite ends to the source 18 and drain 19. The divider node N1 between first and second resistive elements R1, R2 is connected to a second level conductive shield M2. ILD layer 34 isolates the shield M2 from first level conductive M1 contacts.
申请公布号 EP1183734(A1) 申请公布日期 2002.03.06
申请号 EP20010912696 申请日期 2001.02.02
申请人 INTERSIL CORPORATION 发明人 BEASOM, JAMES
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L23/552;H01L27/06;H01L29/06;H01L29/40;H01L29/78;(IPC1-7):H01L29/06 主分类号 H01L27/04
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