发明名称 Deposited-film forming apparatus
摘要 With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost. With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited- film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention. <IMAGE>
申请公布号 EP1136587(A3) 申请公布日期 2002.03.06
申请号 EP20010106178 申请日期 2001.03.13
申请人 SUMITOMO SPECIAL METALS CO., LTD. 发明人 NISHIUCHI, TAKESHI;SHIMAMOTO, IKUO;KIKUI, FUMIAKI;TOCHISHITA, YOSHIMI;SATO, KAZUMITSU
分类号 C23C14/50;H01F1/055;H01F41/02 主分类号 C23C14/50
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