发明名称 |
APPARATUS FOR ANALYZING FREON GAS USING HIGH TEMPERATURE PLASMA |
摘要 |
PURPOSE: An apparatus for analyzing Freon gas is provided to exhaust innoxious gas, by analyzing the Freon gas while using high temperature plasma for forming a temperature higher than thousand degrees temperature and by processing the firstly-analyzed Freon gas while using a solution chamber. CONSTITUTION: A gas induction hole is formed in the upper portion of a plasma gun(100). A reaction chamber is formed in the lower portion of the plasma gun. The plasma gun forms Freon gas of a high temperature plasma state, and adds H2O to the Freon gas so that the H2O-added Freon gas is transformed into a CO2 and HF state. The processed gas is induced to a water solution chamber(200) through a connection pipe connected to the plasma gun. The water solution chamber uniformly sprays a cooling water solution on the entire space to process the gas from the plasma gun and halogen. A pumping unit(300) supplies water from a store tank to the water solution chamber, installed in the lower portion of the water solution chamber. A water solution chamber connection part is installed in the lower portion of an exhaust pipe(400). A dehumidifier is installed in the in the middle portion of the exhaust pipe. A gas exhaust hole is formed in the upper portion of the exhaust pipe. A bypass connection part is installed in a side of the gas exhaust hole. A bypass unit(500) is installed between the gas induction hole and the bypass connection part.
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申请公布号 |
KR20020016705(A) |
申请公布日期 |
2002.03.06 |
申请号 |
KR20000049888 |
申请日期 |
2000.08.26 |
申请人 |
MEDIOPIA INTERNATIONAL CO., LTD.;PARK, JAE KHYUNG |
发明人 |
JANG, IL HONG;PARK, JAE KHYUNG |
分类号 |
H01L21/30;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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