发明名称 CHEMICAL-RESISTANT FILTER
摘要 PROBLEM TO BE SOLVED: To provide a filter cartridge which has resistance to high temperature filtration at 60-80 deg.C of isopropanol frequently used in a semiconductor manufacturing process and in which incineration disposal of used filter is easily performed. SOLUTION: A precision filtration filter cartridge characterized by a constitution wherein, in a pleat type filter cartridge prepared by a constitution wherein the whole of microporous filter membranes, membrane supports, a core, an outer peripheral cover and end plates constituting the filter cartridge is made of a polysulfone based polymer and the filter membranes with the membrane supports are pleat-processed under a condition that the microporous filter membranes are placed among a plurality of membrane supports and the mating surfaces of sheets rounded into a cylindrical shape are liquid-tightly sealed, and in addition, both ends of this cylinder are liquid-tightly sealed with the end plates and only both end parts of the cylindrical pleat filtration membranes are laminated with a polysulfone based polymer film with a thickness of at most 30μm.
申请公布号 JP2002066268(A) 申请公布日期 2002.03.05
申请号 JP20000257421 申请日期 2000.08.28
申请人 FUJI PHOTO FILM CO LTD 发明人 OTANI SUMIO
分类号 B01D63/14;B01D71/68;(IPC1-7):B01D63/14 主分类号 B01D63/14
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