| 摘要 |
PROBLEM TO BE SOLVED: To provide a means capable of washing a substrate without generating the re-adhesion (transfer) of the contaminant, which is removed from the surface of the substrate, to the surface of the substrate. SOLUTION: The apparatus 7, which washes off the contaminant adhering to the surface of the substrate W, is equipped with a support means 22 for supporting the substrate W, a plurality of scrubbing washing instruments 31 and 32 for washing the surface of the substrate W and moving means 26 and 27 for relatively moving a plurality of the scrubbing washing instruments 31 and 32 with respect to the substrate. At least one scrubbing washing instrument 31 among a plurality of the scrubbing washing instruments 31 and 32 is excellent in the removing capacity of the contaminant adhering to the surface of the substrate W as compared with the other scrubbing washing instrument 32. The other scrubbing washing instrument 32 is low in the adhesiveness of the contaminant as compared with one scrubbing washing instrument 31.
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